etching nanofabrication

The Applied Materials P5000 PECVD system is a multi-chamber Plasma Enhanced Chemical Vapor Deposition (PECVD) tool with standard operating temperatures of Chamber B is part of the Applied Materials P5000 RIE system. It is configured for Si based dielectric etching, including SiO2 and Si3N4. Applied Materials ® 0230-09258B P5000 Mk II Mainframe and Support Equipment Manual available for Sale by SDI Group. Item id:105852, model 0230-09258BP5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, For details refer to the operating instructions. Cleanliness:. The Applied Materials P5000 is a plasma enhanced chemical vapor deposition (PECVD) system designed to deposit thin film dielectrics and doped and undoped P5000 CVD Process procedure. Document No: Document Rev: 01. SPECIFICATION FORMAT: EQUIPMENT MANUFACTURER: Applied Materials Equipment. EQUIPMENT MODEL:.